Ability to scale to sub 10nm
Abilty to scale to 22nm in near future
No Field Size Limitations
The system is completely maskless
65k beams in current version. Ability to scale 10X
100mm - 300mm Wafers
HBA is the practice of streaming focused beams of electrons on a surface covered with an electron-sensitive film (resist) to etch desired shapes onto a substrate. This is accomplished primarily when electron beams react with resists, enabling selective removal of either the exposed or non-exposed regions.
HBA offers significant advantages in terms of quality control in IC manufacture with the smallest, cleanest patterns and shapes possible. SecureFoundry's capability represents the holy grail of cost-competitive advanced microelectronic production.